전임교수
전임교수
 학과소개 교수소개 전임교수
전임교수          |          명예교수

 

이름
한정환
전공
박막재료/나노소자
TEL
02-970-6636
E-mail
jhan@seoultech.ac.kr
연구실
프론티어관 814호
교수소개 돌아가기
학력
· 서울대학교, 재료공학부 공학사, 2006
· 서울대학교, 재료공학부 공학박사, 2011
주요 경력
· 서울대학교 BK사업단, 박사 후 연수 연구원, 2011~2012
· Interuniversity Micro-Electronics Center (IMEC, Belgium), Postdoctoral Researcher, 2012~2013
· 한국화학연구원(KRICT) 박막재료연구센터, 선임연구원, 2013~2017
· 서울과학기술대학교, 신소재공학과, 조교수, 2017~현재
연구 분야
· 원자층증착법/화학기상증착법 (ALD/CVD)을 이용한 반도체, 디스플레이, 에너지 소재 응용연구
(1) 디스플레이 박막트랜지스터 소자용 산화물 반도체 소재 개발 연구
(2) DRAM 커패시터 등 메모리 소자용 박막 소재 개발 연구
(3) 에너지 (촉매, 태양전지 등) 소재/소자 개발 연구
(4) 신규 유기금속전구체 개발 및 평가 연구
담당 교과목
· 물리학 및 실험 2
· 반도체 재료
· 나노결정의 물리화학 (대학원)
주요논문 및 저서
(1) Soo Hyun Kim, In-Hwan Baek, Da Hye Kim, Jung Joon Pyeon, Taek-Mo Chung, Seung-Hyub Baek, Jin-Sang Kim, Jeong Hwan Han,** and Seong Keun Kim** “Fabrication of high-performance p-type thin film transistors using atomic-layer-deposited SnO films” Journal of Materials Chemistry C, 2017, 5, 3139.
(2) Raphael Edem Agbenyeke, Eun Ae Jung, Bo Keun Park, Taek-Mo Chung, Chang Gyoun Kim,** Jeong Hwan Han** “Atomic layer deposition of indium oxide thin film from a liquid indium complex containing 1-dimethylamino-2-methyl-2-propoxy ligands”, Applied Surface Science, 2017, 419, 758.
(3) Hyo Yeon Kim, Eun Ae Jung, Geumbi Mun, Raphael E. Agbenyeke, Bo Keun Park, Jin-Seong Park, Seung Uk Son, Dong Ju Jeon, Sang-Hee Ko Park, Taek-Mo Chung,** and Jeong Hwan Han** “Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application”, ACS Applied Materials & Interfaces, 2016, 8, 26924.
(4) Jeong Hwan Han, Yoon Jang Chung, Bo Keun Park, Seong Keun Kim, Hyo-Suk Kim, Chang Gyoun Kim, and Taek-Mo Chung, “Growth of p type Tin(II) Monoxide Thin Films by Atomic Layer Deposition from Bis(1-dimethylamino-2-methyl-2propoxy)tin and H2O”, Chemistry of Materials, 2014, 26, 6088.
(5) Hyo Jun Jung,* Jeong Hwan Han,* Eun Ae Jung, Bo Keun Park, Jin-Ha Hwang, Seung Uk Son, Chang Gyoun Kim, Taek-Mo Chung, and Ki-Seok An, “Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Thin Films from a Zero-Valent (1,5-Hexadiene)(1-isopropyl-4-methylbenzene) ruthenium Complex and O2”, Chemistry of Materials, 2014, 26, 7083.
(6) Jeong Hwan Han, Laura Nyns, Annelies Delabie, Alexis Franquet, Sven Van Elshocht, and Christoph Adelmann, “Reaction Chemistry during the Atomic Layer Deposition of Sc2O3 and Gd2O3 from Sc(MeCp)3, Gd(iPrCp)3, and H2O”, Chemistry of Materials, 2014, 26, 1404.
(7) Jeong Hwan Han, Elisaveta Ungur, Alexis Franquet, Karl Opsomer, Thierry Conard, Alain Moussa, Stefan De Gendt, Sven Van Elshocht, and Christoph Adelmann, “Atomic layer deposition of tantalum oxide and tantalum silicate from TaCl5, SiCl4, and O3 : growth behaviour and film characteristics” Journal of Materials Chemistry C, 2013, 1, 5981.
(8) Jeong Hwan Han, Woongkyu Lee, Woojin Jeon, Sang Woon Lee, and Cheol Seong Hwang, “Growth of Conductive SrRuO3 Films by Combining Atomic Layer Deposited SrO and Chemical Vapor Deposited RuO2 layers”, Chemistry of Materials, 2012, 24, 4686.
(9) Jeong Hwan Han, Sang Woon Lee, Seong Keun Kim, Sora Han, Cheol Seong Hwang, Christian Dussarrat, and Julien Gatineau, “Growth of RuO2 Thin Films by Pulsed-Chemical Vapor Deposition Using RuO4 Precursor and 5% H2 Reduction Gas”, Chemistry of Materials, 2010, 22, 5700.
(10) Jeong Hwan Han, Sang Woon Lee, Gyu-Jin Choi, Sang Young Lee, Cheol Seong Hwang, Christian Dussarrat and Julien Gatineau, “Chemical vapor deposition of Ru thin films with an enhanced morphology, thermal stability and electrical properties using a RuO4 precursor”, Chemistry of Materials, 2009, 21, 207.
저널 논문
◾ Polycrystalline and high purity SnO2 films by plasma-enhanced atomic layer deposition using H2O plasma at very low temperatures of 60–90 ◦C, Vacuum, 2022한정환
◾ Improved dielectric constant and leakage current characteristics of BaTiO3 thin film on SrRuO3 seed layer, Journal of Alloys and Compounds, 2022한정환
◾ Phase-gradient atomic layer deposition of TiO2 thin films by plasma-induced local crystallization, CERAMICS INTERNATIONAL, vol.47 No.20 pp.28770~28777, 2021한정환
◾ Atomic Layer Deposition of Cu2SnS3 Thin Films: Effects of Composition and Heat Treatment on Phase Transformation, CHEMISTRY OF MATERIALS, vol.33 No.20 pp.8112~8123, 2021한정환
◾ Seed layer mediated growth of high dielectric and low leakage BaTiO3 thin film using two-step sputtering process, CERAMICS INTERNATIONAL, vol.47 No.18 pp.25826~25831, 2021한정환
◾ Tunable solid electrolyte interphase formation on SiO anodes using SnO artificial layers for Lithium-ion batteries, APPLIED SURFACE SCIENCE, vol.549, 2021한정환
◾ Atomic-layer-deposited SnO film using novel Sn(dmamb)(2) precursor for p-channel thin film transistor, APPLIED SURFACE SCIENCE, vol.547, 2021한정환
◾ Substrate Surface Modification for Enlarging Two-Dimensional SnS Grains at Low Temperatures, CHEMISTRY OF MATERIALS, vol.32 No.20 pp.9026~9033, 2020한정환
◾ Simultaneous etching of underlying metal oxide and sulfide thin films during Cu2S atomic layer deposition, APPLIED SURFACE SCIENCE, vol.524, 2020한정환
◾ Highly efficient photocatalytic methylene blue degradation over Sn(O,S)/TiO2 photocatalyst fabricated via powder atomic layer deposition of SnO and subsequent sulfurization, MATERIALS LETTERS, vol.272, 2020한정환
◾ Highly sensitive flexible NO2 sensor composed of vertically aligned 2D SnS2 operating at room temperature, Journal of Materials Chemistry C, 2020한정환
◾ Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition, COATINGS, vol.10 No.7, 2020한정환
◾ Atomic-layer-deposited SnO2 on Pt/C prevents sintering of Pt nanoparticles and affects the reaction chemistry for the electrocatalytic glycerol oxidation reaction, Journal of Materials Chemistry A, 2020한정환
◾ Growth characteristics and film properties of plasma-enhanced and thermal atomic-layer-deposited magnesium oxide thin films prepared using bis (ethylcyclopentadienyl)magnesium precursor, CERAMICS INTERNATIONAL, vol.46 No.8 pp.10115~10120, 2020한정환
◾ Cation-Regulated Transformation for Continuous Two-Dimensional Tin Monosulfide, CHEMISTRY OF MATERIALS, vol.32 No.6 pp.2313~2320, 2020한정환
◾ 고분자 전해질 연료전지용 촉매 소재 개발을 위한 원자층증착법 연구 동향, 한국분말야금학회지, vol.27 No.1 pp.63~71, 2020한정환
◾ Atomic layer deposition of pure In2O3 films for a temperature range of 200–300 °C using heteroleptic liquid In(DMAMP)2(OiPr) precursor, Ceramics International, vol.46 pp.3139~3143, 2020한정환
◾ Wafer-Scale, Conformal, and Low-Temperature Synthesis of Layered Tin Disulfides for Emerging Non-Planar and Flexible Electronics, ACS applied materials & interfaces, 2020한정환
◾ Effect of Ag Concentration Dispersed in HfOx Thin Films on Threshold Switching, NANOSCALE RESEARCH LETTERS, vol.15 No.1, 2020한정환
◾ Investigation of phases and chemical states of tin titanate films grown by atomic layer deposition, JOURNAL OF VACUUM SCIENCE TECHNOLOGY A, vol.38 No.1, 2020한정환
◾ Reduction of the Hysteresis Voltage in Atomic‐Layer‐Deposited p‐Type SnO Thin‐Film Transistors by Adopting an Al2O3 Interfacial Layer, Advanced Electronic Materials, 2019한정환
◾ 분말 코팅을 위한 원자층증착법, 한국분말야금학회지, 2019한정환
◾ Low-temperature wafer-scale synthesis of twodimensional SnS2, nanoscale, 2018
[원문보기] 한정환
◾ Effects of SnO2 layer coated on carbon nanofiber for the methanol oxidation reaction, CERAMICS INTERNATIONAL, vol.44 No.16 pp.19554~19559, 2018
[원문보기] 한정환
◾ Growth of Cu2S thin films by atomic layer deposition using Cu(dmamb)(2) and H2S, APPLIED SURFACE SCIENCE, vol.456 pp.501~506, 2018
[원문보기] 한정환
◾ Band gap engineering of atomic layer deposited ZnxSn1-xO buffer for efficient Cu(In,Ga)Se-2 solar cell, PROGRESS IN PHOTOVOLTAICS, vol.26 No.9 pp.745~751, 2018
[원문보기] 한정환
◾ Manipulating superconducting phases via current-driven magnetic states in rare-earth-doped CaFe2As2, NPG ASIA MATERIALS, vol.10 pp.156~162, 2018
[원문보기] 한정환
◾ 원자층증착법을 이용한 수소 생성용 광전기화학 전극소재 개발 동향, 한국분말야금학회지, vol.25 No.1 pp.60~68, 2018
[원문보기] 한정환
◾ Four-Bits-Per-Cell Operation in an HfO2-Based Resistive Switching Device, Small, vol.13 No.40, 2017
[원문보기] 한정환
◾ Thermal atomic layer deposition of In2O3 thin films using dimethyl(N-ethoxy-2,2-dimethylcarboxylicpropanamide)indium and H2O, APPLIED SURFACE SCIENCE, vol.419 pp.758~763, 2017
[원문보기] 한정환
◾ Synthesis of SnS Thin Films by Atomic Layer Deposition at Low Temperatures, CHEMISTRY OF MATERIALS, vol.29 No.19 pp.8100~8110, 2017
[원문보기] 한정환
◾ Ruthenocene Precursors for Ruthenium-Containing Thin-Film Deposition: An Example of Solvent Nucleophilic Attack on Fulvene, ORGANOMETALLICS, vol.36 No.15 pp.2755~2760, 2017
[원문보기] 한정환
◾ Facile synthesis of AlOx dielectrics via mist-CVD based on aqueous solutions, CERAMICS INTERNATIONAL, vol.43 No.12 pp.8932~8937, 2017
[원문보기] 한정환
◾ Fabrication of high-performance p-type thin film transistors using atomic-layer-deposited SnO films, JOURNAL OF MATERIALS CHEMISTRY C, vol.5 No.12 pp.3139~3145, 2017
[원문보기] 한정환
◾ Indium complexes bearing donor-functionalized alkoxide ligands as precursors for indium oxide thin films, JOURNAL OF ORGANOMETALLIC CHEMISTRY, vol.833 pp.43~49, 2017
[원문보기] 한정환
◾ N-Alkoxy Carboxamide Stabilized Tin(II) and Germanium(II) Complexes for Thin-Film Applications, EUROPEAN JOURNAL OF INORGANIC CHEMISTRY, No.36 pp.5539~5546, 2016
[원문보기] 한정환
◾ Atomic layer deposition of indium oxide thin film from a liquid indium complex containing 1-dimethylamino-2-methyl-2-propoxy ligands, APPLIED SURFACE SCIENCE, vol.383 pp.1~8, 2016
[원문보기] 한정환
◾ Low-Temperature Growth of Indium Oxide Thin Film by Plasma-Enhanced Atomic Layer Deposition Using Liquid Dimethyl(N-ethoxy-2,2-dimethylpropanamido)indium for High-Mobility Thin Film Transistor Application, ACS APPLIED MATERIALS INTERFACES, vol.8 No.40 pp.26924~26931, 2016
[원문보기] 한정환
◾ Synthesis of novel tin complexes using functionalized oxime ligands, INORGANICA CHIMICA ACTA, vol.446 pp.1~5, 2016
[원문보기] 한정환
◾ Synthesis of Mono-Imido Tungsten Complexes Directly from WCl6, CHEMISTRYSELECT, vol.1 No.1 pp.44~48, 2016
[원문보기] 한정환
◾ Growth of tantalum nitride film as a Cu diffusion barrier by plasma-enhanced atomic layer deposition from bis((2-(dimethylamino)ethyl)(methyl)amido)methyl(tert-butylimido) tantalum complex, APPLIED SURFACE SCIENCE, vol.362 pp.176~181, 2016
[원문보기] 한정환
◾ Trinuclear magnesium complexes stabilized by aminoalkoxide ligands, JOURNAL OF COORDINATION CHEMISTRY, vol.69 No.17 pp.2591~2597, 2016
[원문보기] 한정환
◾ Growth of amorphous zinc tin oxide films using plasma-enhanced atomic layer deposition from bis(1-dimethylamino-2-methyl-2propoxy)tin,diethylzinc, and oxygen plasma, APPLIED SURFACE SCIENCE, vol.357 pp.672~677, 2015
[원문보기] 한정환
◾ Improved Initial Growth Behavior of Sr and SrTiO3 Films Grown by Atomic Layer Deposition Using {Sr(demamp)(tmhd)}(2) as Sr-Precursor, CHEMISTRY OF MATERIALS, vol.27 No.11 pp.3881~3891, 2015
[원문보기] 한정환
◾ Heteroleptic strontium complexes stabilized by donor-functionalized alkoxide and beta-diketonate ligands, DALTON TRANSACTIONS, vol.44 No.31 pp.14042~14053, 2015
[원문보기] 한정환
◾ Effects of in-situ molecular oxygen exposure on the modulation of electrical properties of zinc oxide thin films grown by atomic layer deposition, PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, vol.212 pp.323~328, 2015
[원문보기] 한정환
◾ Strong hydrophobizer: laterally chemisorbed low-molecular-weight polydimethylsiloxane, CHEMICAL COMMUNICATIONS, vol.51 pp.5844~5847, 2015
[원문보기] 한정환
◾ Atomic Layer Deposition of Ruthenium and Ruthenium Oxide Thin Films from a Zero-Valent (1,5-Hexadiene)(1-isopropyl-4-methylbenzene)ruthenium Complex and O-2, CHEMISTRY OF MATERIALS, vol.26 No.24 pp.7083~7090, 2014
[원문보기] 한정환
◾ Growth of p-Type Tin(II) Monoxide Thin Films by Atomic Layer Deposition from Bis(1-dimethylamino-2-methyl-2propoxy)tin and H2O, CHEMISTRY OF MATERIALS, vol.26 pp.6088~6091, 2014
[원문보기] 한정환
◾ SnO2 thin films grown by atomic layer deposition using a novel Sn precursor, APPLIED SURFACE SCIENCE, vol.320 pp.188~194, 2014
[원문보기] 한정환
◾ Trimethylsilylcyclopentadienyl tris(dimethylamino)zirconium as a single-source metal precursor for the atomic layer deposition of ZrxSi1-xO4, THIN SOLID FILMS, vol.564 pp.140~145, 2014
[원문보기] 한정환
◾ Reaction Chemistry during the Atomic Layer Deposition of Sc2O3 and Gd2O3 from Sc(MeCp)(3), Gd((PrCp)-Pr-i)(3), and H2O, CHEMISTRY OF MATERIALS, vol.26 No.3 pp.1404~1412, 2014
[원문보기] 한정환
◾ Nanoscale Characterization of TiO2 Films Grown by Atomic Layer Deposition on RuO2 Electrodes, ACS APPLIED MATERIALS & INTERFACES, vol.6 pp.2483~2489, 2014
[원문보기] 한정환
◾ Chemistry of active oxygen in RuOx and its influence on the atomic layer deposition of TiO2 films, JOURNAL OF MATERIALS CHEMISTRY C, vol.2 No.46 pp.9993~10001, 2014
[원문보기] 한정환
◾ Influences of metal, non-metal precursors, and substrates on atomic layer deposition processes for the growth of selected functional electronic materials, COORDINATION CHEMISTRY REVIEWS, vol.257 pp.3154~3176, 2013
[원문보기] 한정환
◾ Atomic Layer Deposition of SrTiO3 Films with Cyclopentadienyl-Based Precursors for Metal-Insulator-Metal Capacitors, CHEMISTRY OF MATERIALS, vol.25 pp.953~961, 2013
[원문보기] 한정환
◾ Highly Improved Uniformity in the Resistive Switching Parameters of TiO2 Thin Films by Inserting Ru Nanodots, ADVANCED MATERIALS, vol.25 pp.1987~1992, 2013
[원문보기] 한정환
◾ Atomic layer deposition of tantalum oxide and tantalum silicate from TaCl5, SiCl4, and O-3: growth behaviour and film characteristics, JOURNAL OF MATERIALS CHEMISTRY C, vol.1 No.37 pp.5981~5989, 2013
[원문보기] 한정환
◾ Impact of Bimetal Electrodes on Dielectric Properties of TiO2 and Al-Doped TiO2 Films, ACS APPLIED MATERIALS & INTERFACES, vol.4 pp.4726~4730, 2012
[원문보기] 한정환
◾ Schottky diode with excellent performance for large integration density of crossbar resistive memory, APPLIED PHYSICS LETTERS, 2012
[원문보기] 한정환
◾ Study on Initial Growth Behavior of RuO2 Film Grown by Pulsed Chemical Vapor Deposition: Effects of Substrate and Reactant Feeding Time, CHEMISTRY OF MATERIALS, vol.24 No.8 pp.1407~1414, 2012
[원문보기] 한정환
◾ Controlling the initial growth behavior of SrTiO3 films by interposing Al2O3 layers between the film and the Ru substrate, JOURNAL OF MATERIALS CHEMISTRY, vol.22 pp.15037~15044, 2012
[원문보기] 한정환
◾ Strain evolution of each type of grains in poly-crystalline (Ba,Sr)TiO3 thin films grown by sputtering, SCIENTIFIC REPORTS, vol.2, 2012
[원문보기] 한정환
◾ Growth of Conductive SrRuO3 Films by Combining Atomic Layer Deposited SrO and Chemical Vapor Deposited RuO2 Layers, CHEMISTRY OF MATERIALS, vol.24 pp.4686~4692, 2012
[원문보기] 한정환
◾ Atomic layer deposition of TiO2 and Al-doped TiO2 films on Ir substrates for ultralow leakage currents, PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS, vol.5 No.8 pp.262~264, 2011
[원문보기] 한정환
◾ The mechanism for the suppression of leakage current in high dielectric TiO2 thin films by adopting ultra-thin HfO2 films for memory application, JOURNAL OF APPLIED PHYSICS, vol.110 No.2, 2011
[원문보기] 한정환
◾ Improvement in the leakage current characteristic of metal-insulator-metal capacitor by adopting RuO2 film as bottom electrode, APPLIED PHYSICS LETTERS, vol.99 No.2, 2011
[원문보기] 한정환
◾ Electrical properties of TiO2-based MIM capacitors deposited by TiCl4 and TTIP based atomic layer deposition processes, MICROELECTRONIC ENGINEERING, vol.88 No.7 pp.1514~1516, 2011
[원문보기] 한정환
◾ Atomic Layer Deposition of SrTiO3 Thin Films with Highly Enhanced Growth Rate for Ultrahigh Density Capacitors, CHEMISTRY OF MATERIALS, vol.23 No.8 pp.2227~2236, 2011
[원문보기] 한정환
◾ Role of Interfacial Reaction in Atomic Layer Deposition of TiO2 Thin Films Using Ti(O-iPr)(2)(tmhd)(2) on Ru or RuO2 Substrates, CHEMISTRY OF MATERIALS, vol.23 No.4 pp.976~983, 2011
[원문보기] 한정환
◾ Effect of crystalline structure of TiO2 substrates on initial growth of atomic layer deposited Ru thin films, APPLIED SURFACE SCIENCE, vol.257 No.9 pp.4302~4305, 2011
[원문보기] 한정환
◾ Local Epitaxial Growth of Ru Thin Films by Atomic Layer Deposition at Low Temperature, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol.158 No.8 pp.477~481, 2011
[원문보기] 한정환
◾ Electrically Benign Ru Wet Etching Method for Fabricating Ru/TiO2/Ru Capacitor, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol.158 No.3 pp.47~51, 2011
[원문보기] 한정환
◾ Growth of RuO2 Thin Films by Pulsed-Chemical Vapor Deposition Using RuO4 Precursor and 5% H-2 Reduction Gas, CHEMISTRY OF MATERIALS, vol.22 No.20 pp.5700~5706, 2010
[원문보기] 한정환
◾ A theoretical model for Schottky diodes for excluding the sneak current in cross bar array resistive memory, NANOTECHNOLOGY, vol.21 No.38, 2010
[원문보기] 한정환
◾ Capacitors with an Equivalent Oxide Thickness of < 0.5 nm for Nanoscale Electronic Semiconductor Memory, ADVANCED FUNCTIONAL MATERIALS, vol.20 No.18 pp.2989~3003, 2010
[원문보기] 한정환
◾ Permittivity Enhanced Atomic Layer Deposited HfO2 Thin Films Manipulated by a Rutile TiO2 interlayer, CHEMISTRY OF MATERIALS, vol.22 No.15 pp.4419~4425, 2010
[원문보기] 한정환
◾ Investigation on the Growth Initiation of Ru Thin Films by Atomic Layer Deposition, CHEMISTRY OF MATERIALS, vol.22 No.9 pp.2850~2856, 2010
[원문보기] 한정환
◾ Electrically Benign Dry-Etching Method for Rutile TiO2 Thin-Film Capacitors with Ru Electrodes, ELECTROCHEMICAL AND SOLID STATE LETTERS, vol.13 No.1 pp.1~4, 2010
[원문보기] 한정환
◾ Chemical Vapor Deposition of Ru Thin Films with an Enhanced Morphology, Thermal Stability, and Electrical Properties Using a RuO4 Precursor, CHEMISTRY OF MATERIALS, vol.21 No.2 pp.207~209, 2009
[원문보기] 한정환
◾ Electronic Conduction Mechanism of SrTiO3 Thin Film Grown on Ru Electrode by Atomic Layer Deposition, ELECTROCHEMICAL AND SOLID STATE LETTERS, vol.12 No.11 pp.69~71, 2009
[원문보기] 한정환
◾ Enhanced electrical properties of SrTiO(3) thin films grown by atomic layer deposition at high temperature for dynamic random access memory applications, APPLIED PHYSICS LETTERS, vol.92 No.22, 2008
[원문보기] 한정환
◾ Al-doped TiO2 films with ultralow leakage currents for next generation DRAM capacitors, ADVANCED MATERIALS, vol.20 No.8 pp.1429~1429, 2008
[원문보기] 한정환
◾ Influences of a crystalline seed layer during atomic layer deposition of SrTiO(3) thin films using Ti(O-iPr)(2)(thd)(2), Sr(thd)(2), and H(2)O, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol.155 No.11 pp.253~257, 2008
[원문보기] 한정환
◾ Atomic layer deposition and electrical properties of SrTiO3 thin films grown using Sr(C11H19O2)(2), Ti(Oi-C3H7)(4), and H2O, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol.154 No.6 pp.127~133, 2007
[원문보기] 한정환
학술대회
◾ Eun Chong Ko, Jeong Hwan Han, Growth of low resistivity Ruthenium thin film by atomic layer deposition, TACT 2021, online, 2021한정환
◾ 채명길, 김진아, 장희원, 박보근, 정택모, 한정환, Optimizationof high-performance p-channel SnO thin film transistor using atomic layer deposition, 한국세라믹학회 추계학술대회, 제주 라마다프라자호텔, 2021한정환
◾ 강완구, 한정환, the low resistivity molybdenum thin film by reduction of atomic layer deposited molybdenum carbide using f-free Mo precursor, 한국세라믹학회 추계학술대회, 제주라마다프라자호텔, 2021한정환
◾ 조현희, 원종현, 한정환, Electrical and optical properties of Indium tin oxide thin film with varied Sn concentrations deposited by atomic layer deposition, 한국세라믹학회 추계학술대회, 제주라마다프라자호텔, 2021한정환
◾ 이재현, 강완구, 김재연, 조원호, 한정환, Growth and properties of MoO2 thin film by rf magnetron sputtering, 한국세라믹학회 추계학술대회, 제주라마다프라자호텔, 2021한정환
◾ 고은총, 한정환, low resistivity ruthenium thin film by atomic layer deposition, 한국세라믹학회 추계학술대회, 제주라마다프라자호텔, 2021한정환
◾ 장희원, 김진아, 채명길, 한정환, Growth and characterization of atomic layer deposited ZrO2 thin film as gate dielectric of p-channel thin film transistor, 한국세라믹학회 추계학술대회, 제주라마다프라자호텔, 2021한정환
◾ 원종현, 박보근, 정택모, 한정환, Investigation of In-Ga-Sn-O (IGTO) thin film transistors chracteritics of varying cation composition via plasma-enhanced atomic layer deposition, 한국세라믹학회 추계학술대회, 제주라마다프라자호텔, 2021한정환
◾ 이하영, 조민규, 고재희, 한정환, 최병준, Highly dense titanium nitride thin films grown by hollow cathode plasma atomic layer deposition for Cu diffusion barrier, 한국세라믹학회 추계학술대회, 제주라마다프라자호텔, 2021한정환
◾ 윤필주, 조현희, 박보근, 정택모, 한정환, atomic layer deposition of Ga2O3 thin films using novel Ga precursor, 한국세라믹학회 추계학술대회, 제주라마다프라자호텔, 2021한정환
◾ 김진아, 채명길, 장희원, 박보근, 정택모, 한정환, Effect of discrete feeding method on atomic layer deposited SnO film and its p-channel thin film transistor application, 한국세라믹학회 추계학술대회, 제주 라마다프라자호텔, 2021한정환
◾ 안지상, 한정환, Atomic layer deposition of molybdenum carbide thin film as diffusion barrier for Cu metallization, 한국세라믹학회 추계학술대회, 제주라마다프라자호텔, 2021한정환
◾ Eun Chong Ko and Jeong Hwan Han, Low resistivity ruthenium thin film by atomic layer deposition, ISIMP 2021, online, 2021한정환
◾ Ju Hwan Park, Hee Ju Yun, Jeong Hwan Han, and Byung Joon Choi, Consideration of the reason of reset power reduction in phase change memory by formation of conducting filament in HfO2 interfacial layer, ISIMP 2021, hybrid(online), 2021한정환
◾ 고은총, 고재희, 한정환, development of low resistivity ru film by atomic layer deposition for advanced interconnect application, 한국전기전자재료학회 하계학술대회, 평창알펜시아리조트, 2021한정환
◾ 김진아, 채명길, 장희원, 박보근, 정택모, 한정환, switching characteristics of p-channel sno thin film transistor fabricated by atomic layer deposition using discrete feeding method, 한국전기전자재료학회 하계학술대회, 평창알펜시아, 2021한정환
◾ 강완구, 한정환, Aotmic layer deposition of low-resistivity molybdenum thin film using f-free mo precursor for advanced interconnect application, 한국전기전자재료학회 하계학술대회, 평창알펜시아리조트, 2021한정환
◾ 원종현, 윤필주, 박보근, 정택모, 한정환, Investigation of Ga-doped SnO2 thin film transistor using plasma enhanced atomic layer deposition, 한국전기전자재료학회 하계학술대회, 평창알펜시아리조트, 2021한정환
◾ 채명길, 김진아, 장희원, 박보근, 정택모, 한정환, Effect of hydrogen annealing in atomic layer deposited SnO for high-performance p-channel thin film transistor, 한국전기전자재료학 하계학술대회, 평창알펜시아리조트 , 2021한정환
◾ 안지상, 이재현, 한정환, Atomic layer deposited molybdenum carbide thin films using F-free precursor and H2 and its Cu diffusion barrier application, 한국전기전자재료학회 하계학술대회, 평창 알펜시아, 2021한정환
◾ 임다은, 이예지, 김종현, 김진아, 한정환, 이웅규, Growth of Rutile-TiO2 on Rutile SnO2 for gate oxides in MOS capacitors, 한국전기전자재료학회 하계학술대회, 평창 알펜시아리조트, 2021한정환
◾ 이하영, 최석, 조민규, 고재희, 한정환, 최병준, Electrical Characterization of HfN based diode integration with HfO2-based Resistive Random Access Memory, 한국전기전자재료학회 하계학술대회, 평창 알펜시아리조트, 2021한정환
◾ Wangu Kang, Ji Sang Ahn, and Jeong Hwan Han, Growth of Low-leakage BaTiO3 Thin Film on Polycrystalline Seed Layer by rf Magnetron Sputtering, 한국반도체학술대회, 온라인학회, 2021한정환
◾ Eun Chong Ko, Wangu Kang, and Jeong Hwan Han, Improved Dielectric and Leakage Properties of BaTiO3 Film on SrRuO3 Buffer Electrode, 한국반도체학술대회, 온라인학회, 2021한정환
◾ Jina Kim, Myeong Gil Chae, Jun Choi, Kwan Hyun Cho, Woongkyu Lee, and Jeong Hwan Han, Flexible P-channel SnO Thin Film Transistor Fabricated by Low Temperature Atomic Layer Deposition and Intense Pulsed Light Annealing, 한국반도체학술대회, 온라인학회, 2021한정환
◾ In-Hwan Baek, Ah-Jin Cho, Sangtae Kim, Ga Yeon Lee, Jeong Hwan Han, Taek-Mo Chung, Cheol Seong Hwang, and Seong Keun Kim, Enlargement of Two-Dimensional SnS Grains at Low Temperatures via Substrate Surface Modification, 한국반도체학술대회, 온라인학회, 2021한정환
◾ Myeong Gil Chae, Jina Kim, Bo Keun Park, Taek-Mo Chung, and Jeong Hwan Han, Optimized p-type thin-film transistor with atomic-layer-deposited SnO channel, 한국반도체학술대회, 온라인 학회, 2021한정환
◾ Jong Hyeon Won, Seong Ho Han, Bo Keun Park, Take-Mo Chung, and Jeong Hwan Han, Low Temperature (<100 ℃) Atomic Layer Deposition Of Polycrystalline SnO2 Using Sn(dmamp)2 And H2O Plasma, 한국반도체학술대회, 온라인학회, 2021한정환
◾ Seung Chul Shin, Bo Keun Park, Taek-Mo Chung, and Jeong Hwan Han, 분말 원자층증착법을 이용한 SnS 및 SnO 박막 코팅 및 이를 이용한 TiO2 촉매 특성 향상, 한국반도체학술대회, 온라인학회, 2021한정환
◾ 안지상, 한정환, F-free 전구체를 이용한 Molybdenum 금속 박막의 원자층증착성장 및 물성 평가 연구, 한국반도체학술대회, 온라인학회, 2021한정환
◾ 안지상, 한정환, 차세대 반도체 배선 공정을 위한 Cu대체용 Molybdenum 금속 박막의 원자층박막공정 및 소재 특성 연구, 한국전기전자재료학회 추계학술대회, 경주 the-k 호텔, 2020한정환
◾ 고은총, 강완구, 한정환, SrRuO3 버퍼 전극을 이용한 페로브스카이트 BaTiO3 박막의 유전특성 향상, 한국전기전자재료학 추계학술대회, 경주 the-k 호텔, 2020한정환
◾ Myeong Gil Chae, Bo Keun Park, Take-Mo Chung, and Jeong Hwan Han, Atomic-Layer-Deposition of p-type Tin monoxide using Sn(dmamb)2 and its Thin-Film Transistor application, 16th International Symposium on Novel and Nano Materials, Phoenix Jeju, 2020한정환
◾ Jina Kim, Myeong Gil Chae, Jun Choi, Kwan Hyun Cho, Woongkyu Lee, and Jeong Hwan Han, Fabrication of P-channel SnO Thin Film Transistor on Flexible Substrate by Low-Temperature Atomic Layer Deposition and Intense Pulsed Light Annealing, International symposium on novel and nano materials, phoenix jeju, 2020한정환
◾ 고은총, 한정환, fabrication of polycrystalline SrRuO3 thin films by rf magnetron sputtering on the various substrates, 한국전기전자재료학 춘계학술대회, 휘닉스 평창 , 2020한정환
◾ 채명길, 김진아, 박보근, 정택모, 한정환, high-mobility p-channel thin film transistor with atomic-layer-deposited SnO channel layer, 한국전기전자재료학회 춘계학술대회, 휘닉스평창, 2020한정환
◾ 원종현, 정택모, 박보근, 한정환, Low Temperature (<100 ℃) Growth of Polycrystalline SnO2 Thin Films by Atomic Layer Deposition Using Sn(dmamp)2 and H2O plasma, 한국전기전자재료학회 춘계학술대회, 휘닉스평창, 2020한정환
◾ 강완구, 안지상, 한정환, crystallization and electrical properties of rf magnetron sputtered BaTiO3 thin films on the various substrates, 한국전기전자재료학회 춘계학술대회, 휘닉스 평창, 2020한정환
◾ 신승철, 박보근, 정택모, 한정환, improved photocatalytic activity of graphitic carbon nitride coated with SnO/SnS Bilayer by powder atomic layer deposition method, 한국전기전자재료학회 춘계학술대회, 휘닉스 평창, 2020한정환
◾ 한정환, ALD의 기초원리 및 응용, 학국표면공학회 춘계학술대회, 부산 그린나래 호텔, 2020한정환
◾ Myeong Gil Chae, Bo Keun Park, Taek-Mo Chung, Jeong Hwan Han, Atomic layer deposition of p-type Tin monoxide using Sn(dmamb)2, TACT 2019, GIS TAIPEI TECH Convention Center, 2019한정환
◾ SeungChul Shin, Jeong Hwan Han, Improved photocatalytic activity of Sn(O,S)/TiO2 synthesized by powder atomic layer deposition method, ICAE 2019, 제주 라마다호텔, 2019한정환
◾ Wangu Kang, Jeong Hwan Han, Comparative study of thermal and plasma-enhanced MgO ALD using Mg(EtCp)2 precursor, ICAE 2019 program book, 라마다 플라자 제주 호텔, 2019한정환
◾ Myeong Gil Chae, Bo Keun Park, Taek-Mo Chung, Jeong Hwan Han, Atomic layer deposition of p-type lithium-doped tin monoxide using Sn(dmamp)2, Li(btsa) and H2O, ISIMP 2019 abstract book, Phoenix jeju, 2019한정환
◾ Eun Chong Ko, Jeong Hwan Han, The effect of post deposition annealing on the properties of SrRuO3 thin films deposited by RF magnetron sputtering, ISIMP 2019 abstract book, Phoenix jeju, 2019한정환
◾ Seung Chul Shin, Jeong Hwan Han, Improved photocatalytic activity of Sn(O,S)/TiO2 synthesized by powder atomic layer deposition method, ICAE 2019, 제주 라마다호텔, 2019한정환
◾ Jong Hyeon Won, Seong Ho Han, Bo Keun Park, Taek-Mo Chung, Jeong Hwan Han, comparative study on the growth characteristics and film properties of PEALD SnO2 thin films using different plasma gases, ISIMP 2019 abstract book, Phoenix jeju, 2019한정환
◾ Jeong Hwan Han, Improved catalyst performance by SnOx overcoating using powder atomic layer deposition, 대한화학회 추계학술대회집, 창원컨벤션센터, 2019한정환
◾ In-Hwan Baek, Jung Joon Pyeon, Seong Ho Han, Taek-Mo Chung, Jeong Hwan Han, Han Sol Lee, Cheol Seong Hwang, and Seong Keun Kim, atomic layer deposition of phase-pure 2-D SnS thin films at low temperatures, 2019 한국센서추계학술대회집 제30권 제2-2호, 강릉 라카이샌드파인리조트, 2019한정환
◾ Jung Joon Pyeon, In-Hwan Baek, WooChul Lee, Hansol Lee, Sung Ok Won, Taek-Mo Chung, Jeong Hwan Han, Chong-Yun Kang, SeongKeun Kim, Low-temperature PEALD synthesis of 2D SnS2 for future emerging devices, 한국센서학회추계학술대회집, 강릉 라카이샌드파인리조트, 2019한정환
◾ Myeong Gil Chae, Bo Keun Park, Teak-Mo Chung, Jeong Hwan Han, Properties of p-type SnO Thin film grown by atomic layer deposition using Sn(dmamb)2 and H2O, 한국진공학회 하계정기학술대회 회보집, 대명비발디파크, 2019한정환
◾ Seung Chul Shin, Jeong Hwan Han, Improved photocatalytic activity of Sn(O,S)/TiO2 synthesized by powder atomic layer deposition method, 한국진공학회 하계정기학술대회 회보집, 대명비발디파크, 2019한정환
◾ Wangu Kang, Eun Chong Ko, Byung Joon Choi, Jeong Hwan Han, Comparative study of thermal and plasma-enhanced MgO ALD using Mg(EtCp)2 precursor, 한국진공학회 하계정기학술대회 회보집, 대명비발디파크, 2019한정환
◾ Seung Chul Shin and Jeong Hwan Han, Improved photocatalytic activity of Sn(O,S)/TiO2 synthesized by powder atomic layer deposition method, 한국반도체학술대회집, 강원도 웰리힐리파크, 2019한정환
◾ Jong Hyeon Won, Myeong Gil Chae, Seong Ho Han, Bo Keun Park, Taek-Mo Chung, Jeong Hwan Han, Comparative study on the growth characteristics and film properties of PEALD SnO2 thin films using different plasma gases, 한국발도쳇학술대회집, 강원도 웰리힐리파크, 2019한정환
◾ Wangu Kang and Jeong Hwan Han, Growth behavior and films properties of atomic-layer-deposited MgO Thin film using Mg(EtCp)2 precursor and H2O, 한국반도체학술대회, 강원도 웰리힐리파크, 2019한정환
◾ 한정환, Applications of Atomic layer deposition in chalcogenides thin-film solar cells, 한국세라믹학회 추계학술대회, 코엑스, 2018한정환
◾ 정원희, 김용, 류성연, 한정환, 최병준, 코스퍼터링법으로 제작한 Ag도핑된 HfO2 박막의 전기적 특성, 한국분말야금학회 추계학술대회, 부산해운대그랜드호텔, 2018한정환
◾ 강완구, 한정환, 원자층증착법을 이용한 DRAM 커패시터용 MgO 박막 성장 거동 및 전기적 특성 연구, 한국분말야금학회 추계학술대회, 부산해운대그랜드호텔, 2018한정환
◾ 원종현, 채명길, 한정환, 플라즈마 원자층증착 기술을 이용한 SnO2 박막증착 및 반응가스에 따른 박막 특성 변화, 한국분말야금학회 추계학술대회, 부산해운대그랜드호텔, 2018한정환
◾ 신승철, 한정환, 원자층증착법을 이용한 Sn(O,S)/TiO2 광촉매 소재 합성 및 가시광선 반응성 향상 연구, 한국분말야금학회 추계학술대회, 부산해운대그랜드호텔, 2018한정환
◾ JungJoon Pyeon, In-Hwan Baek, Taek-Mo Chung, Jeong Hwan Han, Chong-Yun Kang, Seong Keun Kim, Synthesis of Single Phase Two-dimensional SnS2 by Plasma-enhanced Atomic Layer Deposition, AVS 65th international symposium & exhibition, long beach convention center, 2018한정환
◾ In-Hwan Baek, Jung Joon Pyeon, Taek-Mo Chung, Jeong Hwan Han, Cheol Seong Hwang, Seong Keun Kim, Atomic Layer Deposited Quaternary In-Zn-Sn-O Thin Films for Emerging Electronic Devices, The 18th International Meeting on Information Display, 부산 벡스코, 2018한정환
◾ G.Y. Lee, S.H. Han, E.A. Jung, C.G. Kim, B.K. Park, J.H. Han, Taek-Mo Chung, Development New Metal Precursors for Atomic Layer Deposition at KRICT, ALD/ALE 2018, 인천 송도 컨벤시아, 2018한정환
◾ Seungmin Yeo, J.H. Han, B.K. Park, C.G. Kim, T.-M. Chung, Atomic Layer Deposition of Cuprous Oxide Thin Films using bis(1-dimethylamino-2-methyl-2-butoxy)Copper Precursor, ALD/ALE 2018, 인천 송도 컨벤시아, 2018한정환
◾ D.H. Kim, S.C. Shin, Seok Choi, J.H. Han, B.J. Choi, Pretreatment Effect of SnO2 Layer Coated on Carbon Nanofiber by Atomic Layer Deposition, ALD/ALE 2018, 인천 송도컨벤시아, 2018한정환
◾ Younjin Jang, J.S. Kim, E.S. Hwang, S. Lee, S.M. Jeon, J.H. Han, C.S. Hwang, Reduction of Hysteresis in p-Type Atomic Layer Deposited SnO Thin Film Transistors by Adopting Interfacial Layers, ALD/ALE 2018, 인천 송도컨벤시아, 2018한정환
◾ Jung Joon Pyeon, I.-H Baek, T.-M. Chung, J.H. Han, C.-Y. Kang, S.K. Kim,, Wafer-scale Growth of Single Phase SnS2 Thin Films by Atomic Layer Deposition, ALD/ALE 2018, 인천송도컨벤시아, 2018한정환
◾ In-Hwan Baek, J.J. Pyeon, T.-M. Chung, J.H. Han, C.S. Hwang, S.K. Kim, Low-temperature Growth of 2-D SnS Thin Films by Atomic Layer Deposition, ALD/ALE 2018, 인천 송도컨벤시아, 2018한정환
◾ J.H. Han, Raphael Agbenyeke, Spontaneous Etching Behavior of Oxide and Sulfide Underlayers during Atomic Layer Deposition of Cu2-xS using Cu(dmamb)2 and H2S, ALD/ALE 2018, 인천 송도 컨벤시아, 2018한정환
◾ Dong Ha Kim, Dong-Yo Shin, Young-Geun Lee, Geon-Hyoung An, Jeong Hwan Han, Hyo-Jin Ahn, and Byung Hoon Choi, Effects of SnO2 Layer coated on Carbon Nanofiber for the methanol oxidation, 15th International Symposium on Novel and Nano Materials, Tivoli Oriente, Lisbon, Portugal, 2018한정환
◾ 김용, 정원희, 윤희주, 한정환, 최병준, 저전압 구동과 자기제어특성을 갖는 Pt/HfO2/Ti 크로스바 어레이 소자, 한국세라믹학회 춘계연구발표회, 창원 컨벤션센터, 2018한정환
◾ Jung Joon Pyeon, In-Hwan Baek, Taek-Mo Chung, Jeong Hwan Han, Chong-Yun Kang, Seong Keun Kim, Synthesis of 2-Dimensional Single Phase SnS2 by Atomic Layer Deposition, 제25회반도체학술대회, 하이원리조트, 2018한정환
◾ In-Hwan Baek, Jung Joon Pyeon, Taek-Mo Chung, Jeong Hwan Han, Cheol Seong Hwang, and Seong Keun Kim, Synthesis of 2-D SnS Thin Films and Their Potential Applications, 제25회반도체학술대회, 하이원리조트, 2018한정환
◾ Younjin Jang, Jun Shik Kim, Eun Suk Hwang, Seungjun Lee, Seok Min Jeon, Jeong Hwan Han, and Cheol Seong Hwang, Hysteric Transfer Characteristics of P-Type Thin Film Transistors with SnO Thin Films Grown by Atomic Layer Deposition, 제25회반도체학술대회, 하이원리조트, 2018한정환
◾ 한정환, Atomic Layer Deposition of Tin Oxides for Versatile Applications, 제25회반도체학술대회, 하이원리조트, 2018한정환
◾ Jeong Hwan Han, Atomic Layer Deposited Tin Oxides for Thin Film Transistor and Catalyst applications, International Symposium on Innovation in Materials Processing, Phoenix Jeju, 2017한정환
저역서
· Jeong Hwan Han et al. Chapter 7. “Front End of the Line Process”, Atomic layer deposition for Semiconductors, Springer, 2014
특허
(1) p형 주석 산화물 박막 제조 및 제어 방법과 이를 이용한 트랜지스터 제조 방법 2016.04.04 (1610623)
(2) 신규한 인듐 전구체, 이의 제조 방법 및 이를 이용한 박막 2016.06.07 (1629696)
(3) 루테늄 화합물, 이의 제조 방법 및 이를 이용하여 박막을 형성하는 방법 2016.06.29 (1636491)
(4) 란탄족 금속 전구체, 이의 제조방법, 및 이를 이용하여 박막을 형성하는 방법 2016.06.29 (1636490)
(5) 4족 전이금속 전구체, 이의 제조 방법, 및 이를 이용하여 박막을 형성하는 방법 2015.11.20 (1572086)
연구프로젝트
◾ DRAM capacitor 용 BeO 박막 연구(2차년도), 삼성전자(주), 2019.04.~2020.09.한정환
◾ 차세대 DRAM Capacitor 적용을 위한 SrTiO3BaTiO3 Superlattice 고유전율 박막 개발, 한국산업기술평가관리원, 2019.04.~2021.12.한정환
◾ 고분자 전해질 연료전지용 촉매 소재 개발을 위한원자층증착법 연구 동향, 산학협력단, 2019.03.~2020.02.한정환
◾ 알칼리 금속 도핑을 통한 고성능 p형 전도성 산화물 개발 및 투명 로직 소자 응용, 한국연구재단, 2019.03.~2022.02.한정환
◾ 원자층증착법을 이용한 수소 생성용 광전기화학 전극 소재 개발 동향, 산학협력단, 2018.02.~2018.04.한정환
◾ 차세대 에너지 독립형 IoT 대응을 위한 에너지 핵심 소재 플랫폼 기술개발, 산학협력단, 2018.02.~2021.01.한정환
◾ 원자층증착법을 이용한 산화물 반도체 소재 개발 및 소자화 연구, 한국화학연구원, 2018.01.~2021.12.한정환
수상
◾ Effect of Atomic layer deposited HfO2 or ZrO2 interlayer on the electrical performance of p-type snO thin film transistor, KCS 2022 현장우수포스터상, 한국반도체학술대회, 2022한정환
◾ Optimized p-type thin film transistor with atomic layer deposited SnO channel layer, SK하이닉스 논문상, 한국반도체학술대회, 2022한정환
◾ 2020년도 연구분야 우수교원, 2020년도 연구분야 우수교원 표창, 서울과학기술대학교 산학협력단, 2021한정환
◾ atomic layer deposited Molybdenum carbide thin films using F-free precursor and H2 and its Cu diffusion barrier application, 최우수 발표상, 한국전기전자재료학회, 2021한정환
◾ 분말 원자층증착법을 이용한 SnS 및 SnO 박막 코팅 및 이를 이용한 TiO2 촉매 특성 향상, 현장우수포스터상, 한국반도체학술대회, 2021한정환
◾ 차세대 반도체 배선 공정을 위한 Cu 대체용 Molybdenum 금속 박막의 원자층박막공정 및 소재 특성 연구, 우수 논문상, 한국전기전자재료학회, 2020한정환
◾ SrRuO3 버퍼전극을 이용한 페로브스카이트 BaTiO3 박막의 유전특성 향상, 우수 논문상, 한국전기전자재료학회, 2020한정환
◾ High-mobility p-channel thin film transistor with atomic-layer-deposited SnO channel layer, 우수논문상, 한국전기전자재료학회, 2020한정환
◾ Comparative study on the growth charactgeristics and film properties of PEALD SnO2 thin films using different plasma gases, Best Presentation Award, ISIMP 2019, 2019한정환

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